Interference lithography is an emerging, technology that provides a means for achieving high resolution over large exposure areas (approximately 1 m{sup 2}) with virtually unlimited depth of field. One- and two-dimensional arrays of deep submicron structures can be created using near i-line wavelengths and standard resist processing. In this paper, we report on recent advances in the development of this technology, focusing, in particular, on how exposure latitude and resist profile scale with interference period We present structure width vs dose curves for periods ranging from 200 nm to 1 um, demonstrating that deep submicron structures can be generated with exposure latitudes exceeding 30%. Our experimental results are compared to simulations based on PROLITIV2.

Hydrous Pyrolysis / Oxidation (HPO) is an in situ thermal remediation technology that uses hot, oxygenated groundwater to completely mineralize a wide range of organic pollutants. A field demonstration of HPO was performed at a creosote contaminated site during the summer of 1997. The groundwater was heated by steam injections and oxygen was added by coinjection of compressed air. The remediation was monitored from multiple groundwater monitoring wells. Dissolved organic carbon levels increased in response to steam injections as a result of the enhanced dissolution and mobilization of the creosote into the heated groundwater. Elevated concentrations of partially oxidized organic compounds (i.e. phenols, benzoic acid, fluorenone, anthrone and 9,10- anthracenedione), decreased levels of dissolved oxygen and isotopic shifts in the dissolved inorganic pool were indicators of partial to complete oxidative destruction of the creosote in the heated aquifer as a result of the HPO process.