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Plasma modification of vanadium oxynitride surfaces: Characterization by in situ XPS experiments and DFT calculations
Article reports XPS and DFT findings regarding the O₂ plasma, NH₃ plasma, and NH₃+O₂ plasma treatment of sputter deposited vanadium oxynitride films.
Date:
October 13, 2020
Creator:
Osonkie, A.; Lee, V.; Chukwunenye, P.; Cundari, Thomas R., 1964- & Kelber, Jeffry A.
System:
The UNT Digital Library