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Forensic Science Applications Utilizing Nanomanipulation-Coupled to Nanospray Ionization-Mass Spectrometry for the Analysis of Ultra-Trace Illicit Drugs
Soft Landing Ion Mobility Mass Spectrometry: History, Instrumentation and an Ambient Pressure Application
Surface Chemical Deposition of Advanced Electronic Materials
Free Radical Chemistries at the Surface of Electronic Materials
Free Radical Induced Oxidation, Reduction and Metallization of NiSi and Ni(Pt)Si Surfaces
FTIR-ATR Characterization of Hydrogel, Polymer Films, Protein Immobilization and Benzotriazole Adsorption on Copper Surface
Electrodeposition of Copper on Ruthenium Oxides and Bimetallic Corrosion of Copper/Ruthenium in Polyphenolic Antioxidants
Study of Copper Electrodeposition on Ruthenium Oxide Surfaces and Bimetallic Corrosion of Copper/Ruthenium in Gallic Acid Solution
Study of Substituted Benzenesulfonate-Containing Layered Double Hydroxides and Investigation of the Hexamethylenetetramine Route of LDH Synthesis
Electrochemical Synthesis and Characterization of Inorganic Materials from Aqueous Solutions
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The synthesis and study of poly(N-isopropylacrylamide)/poly(acrylic acid) interpenetrating polymer network nanoparticle hydrogels.
Thermodynamics of the Abraham General Solvation Model: Solubility and Partition Aspects
Cu Electrodeposition on Ru with a Chemisorbed Iodine Surface Layer.
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Metal Oxide Reactions in Complex Environments: High Electric Fields and Pressures above Ultrahigh Vacuum
Process Evaluation and Characterization of Tungsten Nitride as a Diffusion Barrier for Copper Interconnect Technology
The Revival of Electrochemistry: Electrochemical Deposition of Metals in Semiconductor Related Research
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Study of Ruthenium and Ruthenium Oxide's Electrochemical Properties and Application as a Copper Diffusion Barrier
Chemistry, Detection, and Control of Metals during Silicon Processing
Interfacial Study of Copper Electrodeposition with the Electrochemical Quartz Crystal Microbalance (EQCM)
Synthesis and study of crystalline hydrogels, guided by a phase diagram.
Tantalum- and ruthenium-based diffusion barriers/adhesion promoters for copper/silicon dioxide and copper/low κ integration.
Adherence/Diffusion Barrier Layers for Copper Metallization: Amorphous Carbon:Silicon Polymerized Films
Electrodeposition of adherent copper film on unmodified tungsten.
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Passivation effects of surface iodine layer on tantalum for the electroless copper deposition.
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