Transcript of an interview with Lloyd Gossell, a Marine Corps veteran (A Company, 1st Battalion, 28th Regiment, 5th Marine Division), concerning his experiences during the assault on Iwo Jima, February-March, 1945. Gossell discusses his enlistment and boot camp, San Diego, California, 1942; assignment to the 3rd Marine Parachute Battalion, 1942; jungle training on New Caledonia, 1942-43; transfer to Guadalcanal, 1943; combat on Bougainville, 1943-44; return to the States to help form the 5th Marine Division; final training, Camp Tarawa, Hawaii, 1944-45; briefings and meetings en route to Iwo Jima; the pre-invasion bombardment of Iwo Jima; the initial assault on February 17, 1945; conditions on Green Beach; the assault across terraces to the base of Mount Suribachi; isolating Mount Suribachi from the rest of the island; transfer to the north end of Iwo Jima and combat on Hill 362-A; combat in "Death Valley"; occupation of Japan. Appendix includes a map of the landings for the invasion of Iwo Jima.

Interview with Norbert N. Gebhard. The interview includes Gebhard's personal experiences about employment by the Civilian Conservation Corps during the Great Depression.

EUV lithography (EUVL) employs illumination wavelengths around 13.5 nm, and in many aspects it is considered an extension of optical lithography, which is used for the high-volume manufacturing (HVM) of today's microprocessors. The EUV wavelength of illumination dictates the use of reflective optical elements (mirrors) as opposed to the refractive lenses used in conventional lithographic systems. Thus, EUVL tools are based on all-reflective concepts: they use multilayer (ML) coated optics for their illumination and projection systems, and they have a ML-coated reflective mask.