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Projection Optics for Extreme Ultraviolet Lithography (EUVL) Microfield Exposure Tools (METs) with a Numerical Aperture of 0.5
Discusses the on-going efforts to develop and fabricate the optical projection module.
Date:
July 12, 2013
Creator:
Glatzel, Holger; Ashworth, Dominic; Bremer, Mark; Chin, Rodney; Cummings, Kevin; Girard, Luc et al.
System:
The UNT Digital Library
Transverse Momentum Resummation for Top Quark Pairs Production at Hadron Collider
None
Date:
July 12, 2013
Creator:
Li, Hai Tao; Li, Chong Sheng; Shao, Ding Yu; Yang, Li Lin & Zhu, Hua Xing
System:
The UNT Digital Library