Low-dielectric (k) films are one of the performance drivers for continued scaling of integrated circuit devices. These films are needed in microelectronic device interconnects to lower power consumption and minimize cross talk between metal lines that "interconnect" transistors. Low-k materials currently in production for the 45 and 65 nm node are most often organosilicate glasses (OSG) with dielectric constants near 2.8 and nominal porosities of 8-10%. The next generation of low-k materials will require k values 2.6 and below for the 45 nm device generation and beyond. The continuous decrease in device dimensions in ultra large scale integrated (ULSI) circuits have brought about the replacement of the silicon dioxide interconnect dielectric (ILD), which has a dielectric constant (k) of approximately 4.1, with low dielectric constant materials. Lowering the dielectric constant reduces the propagation delays, RC constant (R = the resistance of the metal lines; C = the line capacitance), and metal cross-talk between wires. In order to reduce the RC constants, a number of low-k materials have been studied for use as intermetal dielectrics. The k values of these dielectric materials can be lowered by replacing oxide films with carbon-based polymer films, incorporating hydrocarbon functional groups into oxide films (SiOCH …

Friction and wear mitigation is typically accomplished by introducing a shear accommodating layer (e.g., a thin film of liquid) between surfaces in sliding and/or rolling contacts. When the operating conditions are beyond the liquid realm, attention turns to solid coatings. Solid lubricants have been widely used in governmental and industrial applications for mitigation of wear and friction (tribological properties). Conventional examples of solid lubricants are MoS2, WS2, h-BN, and graphite; however, these and some others mostly perform best only for a limited range of operating conditions, e.g. ambient air versus dry nitrogen and room temperature versus high temperatures. Conversely, lubricious oxides have been studied lately as good potential candidates for solid lubricants because they are thermodynamically stable and environmentally robust. Oxide surfaces are generally inert and typically do not form strong adhesive bonds like metals/alloys in tribological contacts. Typical of these oxides is ZnO. The interest in ZnO is due to its potential for utility in a variety of applications. To this end, nanolaminates of ZnO, Al2O3, ZrO2 thin films have been deposited at varying sequences and thicknesses on silicon substrates and high temperature (M50) bearing steels by atomic layer deposition (ALD). The top lubricious, nanocrystalline ZnO layer was structurally-engineered …

Ni/TiC metal matrix composites have been processed using the laser engineered net shaping (LENS) process. As nickel does not form an equilibrium carbide phase, addition of a strong carbide former in the form of titanium reinforces the nickel matrix resulting in a promising hybrid material for both surface engineering as well as high temperature structural applications. Changing the relative amounts of titanium and carbon in the nickel matrix, relatively low volume fraction of refined homogeneously distributed carbide precipitates, formation of in-situ carbide precipitates and the microstructural changes are investigated. The composites have been characterized in detail using x-ray diffraction, scanning electron microscopy (including energy dispersive spectroscopy (XEDS) mapping and electron backscatter diffraction (EBSD)), Auger electron spectroscopy, and transmission (including high resolution) electron microscopy. Both primary and eutectic titanium carbides, observed in this composite, exhibited the fcc-TiC structure (NaCl-type). Details of the orientation relationship between Ni and TiC have been studied using SEM-EBSD and high resolution TEM. The results of micro-hardness and tribology tests indicate that these composites have a relatively high hardness and a steady-state friction coefficient of ~0.5, both of which are improvements in comparison to LENS deposited pure Ni.