Article on a pilot study to improve pain management and caregiver participation in hospice interdisciplinary team meetings via videophone technology.

The pathway of electrons required for the reduction of sulfate in sulfate-reducing bacteria (SRB) is not yet fully characterized. In order to determine the role of a transmembrane protein complex suggested to be involved in this process, a deletion of Desulfovibrio vulgaris Hildenborough was created by marker exchange mutagenesis that eliminated four genes putatively encoding the QmoABC complex and a hypothetical protein (DVU0851). The Qmo complex (quinone-interacting membrane-bound oxidoreductase) is proposed to be responsible for transporting electrons to the dissimilatory adenosine-5?phosphosulfate (APS) reductase in SRB. In support of the predicted role of this complex, the deletion mutant was unable to grow using sulfate as its sole electron acceptor with a range of electron donors. To explore a possible role for the hypothetical protein in sulfate reduction, a second mutant was constructed that had lost only the gene that codes for DVU0851. The second constructed mutant grew with sulfate as the sole electron acceptor; however, there was a lag that was not present with the wild-type or complemented strain. Neither deletion strain was significantly impaired for growth with sulfite or thiosulfate as terminal electron acceptor. Complementation of the D(qmoABC-DVU0851) mutant with all four genes or only the qmoABC genes restored its …

New simulations of graphene growth in flame environments are presented. The simulations employ a kinetic Monte Carlo (KMC) algorithm coupled to molecular mechanics (MM) geometry optimization to track individual graphenic species as they evolve. Focus is given to incorporation of five-member rings and resulting curvature and edge defects. The model code has been re-written to be more computationally efficient enabling a larger set of simulations to be run, decreasing stochastic fluctuations in the averaged results. The model also includes updated rate coefficients for graphene edge reactions recently published in the literature. The new simulations are compared to results from the previous model as well as to hydrogen to carbon ratios recorded in experiment and calculated with alternate models.

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Accurate short-term forecasts of wind resources are required for efficient wind farm operation and ultimately for the integration of large amounts of wind-generated power into electrical grids. Siemens Energy Inc. and Lawrence Livermore National Laboratory, with the University of Colorado at Boulder, are collaborating on the design of an operational forecasting system for large wind farms. The basis of the system is the numerical weather prediction tool, the Weather Research and Forecasting (WRF) model; large-eddy simulations and data assimilation approaches are used to refine and tailor the forecasting system. Representation of the atmospheric boundary layer is modified, based on high-resolution large-eddy simulations of the atmospheric boundary. These large-eddy simulations incorporate wake effects from upwind turbines on downwind turbines as well as represent complex atmospheric variability due to complex terrain and surface features as well as atmospheric stability. Real-time hub-height wind speed and other meteorological data streams from existing wind farms are incorporated into the modeling system to enable uncertainty quantification through probabilistic forecasts. A companion investigation has identified optimal boundary-layer physics options for low-level forecasts in complex terrain, toward employing decadal WRF simulations to anticipate large-scale changes in wind resource availability due to global climate change.

Microfield exposure tools (METs) play a crucial role in the development of extreme ultraviolet (EUV) resists and masks, One of these tools is the SEMATECH Berkeley 0.3 numerical aperture (NA) MET, Using conventional illumination this tool is limited to approximately 22-nm half pitch resolution. However, resolution enhancement techniques have been used to push the patterning capabilities of this tool to half pitches of 18 nm and below, This resolution was achieved in a new imageable hard mask which also supports contact printing down to 22 nm with conventional illumination. Along with resolution, line-edge roughness is another crucial hurdle facing EUV resists, Much of the resist LER, however, can be attributed to the mask. We have shown that intenssionally aggressive mask cleaning on an older generation mask causes correlated LER in photoresist to increase from 3.4 nm to 4,0 nm, We have also shown that new generation EUV masks (100 pm of substrate roughness) can achieve correlated LER values of 1.1 nm, a 3x improvement over the correlated LER of older generation EUV masks (230 pm of substrate roughness), Finally, a 0.5-NA MET has been proposed that will address the needs of EUV development at the 16-nm node and beyond, The …