An event-driven, sequential, process control system was designed for International Isotopes, Inc., to automate and remotely control a target station at the company's linear accelerator facility. The designed system consisted of two major sections: a software program (virtual instrument), which was developed by LabVIEW, and a hardware interface (FieldPoint Modular Distributed I/O System by National Instrument), which had to be a pre-developed system that did not require customization. The designed virtual instrument was tested on a simulation model that mimed the target station. The result was a valid design.

Plasma cleaning is the most effective dry process to remove surface contaminates from a SAW (Surface Acoustical Wave) device. Consistent gas pressures, flows, and good electrical connections between the chamber shelves are necessary for the process to function predictably. In addition, operation of the monitoring system must be transparent to the plasma cleaning unit. This thesis describes a simple solution to the complex problem of monitoring a plasma cleaning system. The monitoring system uses the LabVIEW® G programming language and hardware, both products of National Instruments, Inc.®, to monitor critical parameters necessary to achieve a consistent process when cleaning these devices.