Thermal annealing behavior of an oxide layer under silicon (open access)

Thermal annealing behavior of an oxide layer under silicon

This article discusses the thermal annealing behavior of an oxide layer under silicon.
Date: September 27, 1982
Creator: Hamdi, A. H.; McDaniel, Floyd Del. (Floyd Delbert), 1942-; Pinizzotto, Russell F.; Matteson, Samuel E.; Lam, H. W. & Malhi, S. D. S.
System: The UNT Digital Library