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Magnetron co-sputtering system for coating ICF targets (open access)

Magnetron co-sputtering system for coating ICF targets

Fabrication of Inertial Confinement Fusion (ICF) targets requires deposition of various types of coatings on microspheres. The mechanical strength, and surface finish of the coatings are of concern in ICF experiments. The tensile strength of coatings can be controlled through grain refinement, selective doping and alloy formation. We have constructed a magnetron co-sputtering system to produce variable density profile coatings with high tensile strength on microspheres. The preliminary data on the properties of a Au-Cu binary alloy system by SEM and STEM analysis is presented.
Date: December 9, 1981
Creator: Hsieh, E. J.; Meyer, S. F.; Halsey, W. G.; Jameson, G. T. & Wittmayer, F. J.
System: The UNT Digital Library