Electrical Limitations To Energy Resolution In Semiconductor Particle Detectors (open access)

Electrical Limitations To Energy Resolution In Semiconductor Particle Detectors

Based on the assumption that the noise contribution of a semiconductor detector is due solely to the bulk properties of the semiconductor, equations are presented which indicate the theoretical limits of noise in detector-amplifier combinations. These equations show that an optimum amplifier time constant and detector bias voltage exist for which condition the minimum noise is independent of the semiconductor resistivity. The optimum performance of a detector-amplifier system is shown to depend only upon detector area, input capacity (less detector capacity), semiconductor minority carrier lifetime, and the transconductance of the amplifier input tube. A new detector structure including a guard-ring electrode as an integral part of the detector structure is described which largely eliminates noise due to surface leakage. Experimental results for detector leakage and energy resolution are presented which agree well with theory.
Date: April 5, 1961
Creator: Hansen, William L. & Goulding, Frederick S.
System: The UNT Digital Library
Improved Zirconium Alloys : Ninth Monthly Report Covering the Period December 1 to December 31, 1960 (open access)

Improved Zirconium Alloys : Ninth Monthly Report Covering the Period December 1 to December 31, 1960

The following report is the ninth in a series of monthly reports covering the program with the objective of developing alloys having superior 680 F water and/or 750 to 900 F steam corrosion resistance, as well as developing higher strength alloys for current temperature ranges while still maintaining corrosion resistance comparable to that of Zircaloy-2. This report was made covering the period December 1 to December 31, 1960.
Date: January 5, 1961
Creator: Weinstein, Daniel & Van Thyne, R. J.
System: The UNT Digital Library
Preparation of Thin, Self-supporting Copper Films (open access)

Preparation of Thin, Self-supporting Copper Films

A repeatable technique for preparation of thin, self-supporting copper films has been developed at the Lawrence Radiation Laboratory in Livermore, California. The process, done in a vacuum chamber, involves evaporation of copper by electron bombardment, and deposition of the copper on a detergent-coast glass substrate. The copper film is later removed from the substrate by immersion in water.
Date: January 5, 1961
Creator: Brunner, W. & Patton, H.
System: The UNT Digital Library