1 Matching Results
Results open in a new window/tab.
Results:
1 - 1 of
1
FEL Oscillator for EUV Lithography
Report on a study to develop radiation sources for extreme ultraviolet lithography (EUVL) by using a free-electron laser (FEL) with a short-period undulator and a relatively small beam energy.
Date:
March 6, 2014
Creator:
Stupakov, G. & Zolotorev, M. S.
System:
The UNT Digital Library