"This manual covers the methods and procedure for the control of field artillery fire using air observation."

EUV lithography (EUVL) employs illumination wavelengths around 13.5 nm, and in many aspects it is considered an extension of optical lithography, which is used for the high-volume manufacturing (HVM) of today's microprocessors. The EUV wavelength of illumination dictates the use of reflective optical elements (mirrors) as opposed to the refractive lenses used in conventional lithographic systems. Thus, EUVL tools are based on all-reflective concepts: they use multilayer (ML) coated optics for their illumination and projection systems, and they have a ML-coated reflective mask.

Interview with Alton C. Halbrook, a Marine WWII veteran and POW who was captured by the Japanese at Corregidor. Halbrook discusses joining the Marine Corps and prewar duty in Shanghai, transfer to the Philippines, the Japanese invasion, retreat to Corregidor, the American surrender and capture by Japanese forces, internment at Camp O'Donnell and Cabanatuan, transfer to Clark Field and labor there, transit to Japan, internment and labor at a Japanese steel mill, a powerplant, and a factory, and the end of the war. In appendix is an autobiographical account by Halbrook.

This is a collection of texts in Kom including folklore and histories of relation between Kom and groups in surrounding areas such as Mongolia, Myanmar, and Tripura.

Interview with Bill Overall, businessman and U.S. Army WWII veteran, concerning his experiences at the Schofield Barracks with the 21st Infantry, G Company during the Japanese attack at Pearl Harbor on December 7, 1941.

Audio interview with Elston Brooks, a journalist who worked at the Fort Worth Press and then the Star-Telegram, discussing his memories and experiences of being a newspaperman during the Kennedy assassination on November 22, 1963. Brooks also discusses his love of music and performance.