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Rapid isothermal annealing of As-, P-, and B-implanted silicon
This article discusses rapid idothermal annealing of As-, P-, and B-implanted silicon.
Date:
June 15, 1984
Creator:
Wilson, Scott R.; Paulson, W. M.; Gregory, R. B.; Hamdi, A. H. & McDaniel, Floyd Del. (Floyd Delbert), 1942-
System:
The UNT Digital Library
Thermal annealing behavior of an oxide layer under silicon
This article discusses the thermal annealing behavior of an oxide layer under silicon.
Date:
September 27, 1982
Creator:
Hamdi, A. H.; McDaniel, Floyd Del. (Floyd Delbert), 1942-; Pinizzotto, Russell F.; Matteson, Samuel E.; Lam, H. W. & Malhi, S. D. S.
System:
The UNT Digital Library