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Aluminum and Copper Chemical Vapor Deposition on Fluoropolymer Dielectrics and Subsequent Interfacial Interactions (open access)

Aluminum and Copper Chemical Vapor Deposition on Fluoropolymer Dielectrics and Subsequent Interfacial Interactions

This study is an investigation of the chemical vapor deposition (CVD) of aluminum and copper on fluoropolymer surfaces and the subsequent interfacial interactions.
Date: December 1997
Creator: Sutcliffe, Ronald David
Object Type: Thesis or Dissertation
System: The UNT Digital Library
Computational studies of the potential energy surface for O(³P) + H₂S: Characterization of transition states and the enthalpy of formation of HSO and HOS (open access)

Computational studies of the potential energy surface for O(³P) + H₂S: Characterization of transition states and the enthalpy of formation of HSO and HOS

Article on computational studies of the potential energy surface for O(³P) + H₂S and the characterization of transition states and the enthalpy of formation of HSO and HOS.
Date: January 1, 1995
Creator: Goumri, Abdellatif; Laakso, Dianna; Rocha, John-David Ray; Smith, C. E. & Marshall, Paul
Object Type: Article
System: The UNT Digital Library