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The positions of λₘₐₓ for some trimethylsilyl-substituted silylenes
This article describes how low-temperature photolysis of tris(trimethylsilyl)silane derivatives in a 3-methylpentane glass at 77 K yields hexamethyldisilane and trimethylsilyl-substituted silylenes.
Date:
April 17, 1995
Creator:
Bott, S. G.; Marshall, Paul; Wagenseller, P. E.; Wang, Y. & Conlin, R. T.
System:
The UNT Digital Library