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Evidence for Strong Tantalum-to-Boron Dative Interactions in (silox)3Ta(BH3) and (silox)3Ta(ɳ2-B,CI-BCI2Ph) (silox = tBu3SiO)1
This article discusses strong tantalum-to-boron dative interactions in (silox)3Ta(BH3) and (silox)3Ta(ɳ2-B,CI-BCI2Ph) (silox = tBu3SiO)1.
Date:
January 24, 2007
Creator:
Bonanno, Jeffrey B.; Henry, Thomas P.; Wolczanski, Peter T.; Pierpont, Aaron W. & Cundari, Thomas R., 1964-
Object Type:
Article
System:
The UNT Digital Library
Method of Making Integrated Circuits Using Ruthenium and its Oxides as a Cu Diffusion Barrier
Patent relating to a method of making integrated circuits using ruthenium and its oxides as a Cu diffusion barrier.
Date:
June 20, 2003
Creator:
Chyan, Oliver M. R. & Ponnuswamy, Thomas
Object Type:
Patent
System:
The UNT Digital Library