Production and shielding of x rays from electron beam vapor sources (open access)

Production and shielding of x rays from electron beam vapor sources

Electron-beam vapor sources are now widely used in material processing sciences and coating technologies, such as the semiconductor industry for producing aluminum films on Si wafers; the metallurgical industry for melting, evaporating, and refining metals; and at Lawrence Livermore National Laboratory (LLNL) for vaporizing metals for laser isotope separation applications. Power for these sources ranges from the kW regime in the semiconductor industry to the multi-MW regime in laser separation technology. Operations of these sources can generate copious amounts of x rays by the direct and indirect interactions of the energetic electrons with the target materials. In this paper, we present the results of our calculations regarding the x-ray emission intensity, angular intensity and energy spectrum distribution, and shielding characteristics for vapor sources with acceleration voltages from 10 kV to 60 kV. 4 refs., 12 figs., 2 tabs.
Date: November 14, 1986
Creator: Singh, M.S.
Object Type: Article
System: The UNT Digital Library
Single pass collider memo: Dispersive effects of orbit errors in the SLC arcs (open access)

Single pass collider memo: Dispersive effects of orbit errors in the SLC arcs

An analytical attempt is made to estimate the perturbations of eta-functions after orbit correction of the SLC arcs. Emphasis is on the effects caused by the orbit errors created by misalignments. It is shown that the 'non-dispersive' property of a 'magnet mover' is not true whenever the vertical off-energy function is non-zero. The north arc is used as an example for numerical calculation. (LEW)
Date: November 14, 1986
Creator: Weng, W. & Sands, M.
Object Type: Report
System: The UNT Digital Library