The convention for field emission cathode (FEC) synthesis involves coating with a very-high tolerance in thickness uniformity using a planetary substrate fixture and a large source-to-substrate separation. New criteria for a deposition process must facilitate a reduction in the operating voltage by increasing the density of emitters through a reduction of cathode size and spacing. The objective of scaling the substrate size from small (less than 30 cm{sup 2}) to large (greater than 500 cm{sup 2}) areas further compounds manufacturing requirements to a point beyond that easily obtained by modifications to the convention for FEC deposition. A new patented approach to design, assemble, and operate a coating system enables FEC deposition over large areas through process control of source divergence coupled to incremental substrate positioning.