This invention is comprised of a method of fabricating metal oxide films from a plurality of reactants by inducing a reaction by plasma deposition among the reactants. The plasma reaction is effective for consolidating the reactants and producing thin films of metal oxides, e.g. electro-optically active transition metal oxides, at a high deposition rate. The presence of hydrogen during the plasma reaction enhances the deposition rate of the metal oxide. Various types of metal oxide films can be produced.

An electrolyte composite is manufactured by pressurizing a mixture of ionically conductive glass and an ionically conductive compound at between 12,000 and 24,000 pounds per square inch to produce a pellet. The resulting pellet is then sintered at relatively lower temperatures (800{degrees}C--1200{degrees}C), for example 1000{degrees}C, than are typically required (1400{degrees}C) when fabricating single constituent ceramic electrolytes. The resultant composite is 100 percent conductive at 250{degrees}C with conductivity values of 2.5 to 4 {times} 10{sup {minus}2} (ohm-cm){sup {minus}1}. The matrix exhibits chemical stability against sodium for 100 hours at 250 to 300{degrees}C.

A focused ion beam having a cross section of submicron diameter, a high ion current, and a narrow energy range is generated from a target comprised of particle source material by laser ablation. The method involves directing a laser beam having a cross section of critical diameter onto the target, producing a cloud of laser ablated particles having unique characteristics, and extracting and focusing a charged particle beam from the laser ablated cloud. The method is especially suited for producing focused ion beams for semiconductor device analysis and modification.