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Virtually distortion-free imaging system for large field, high resolution lithography using electrons, ions or other particle beams (open access)

Virtually distortion-free imaging system for large field, high resolution lithography using electrons, ions or other particle beams

Virtually distortion free large field high resolution imaging is performed using an imaging system which contains large field distortion or field curvature. A reticle is imaged in one direction through the optical system to form an encoded mask. The encoded mask is then imaged back through the imaging system onto a wafer positioned at the reticle position. Particle beams, including electrons, ions and neutral particles, may be used as well as electromagnetic radiation.
Date: April 10, 1991
Creator: Hawryluk, A. M. & Ceglio, N. M.
System: The UNT Digital Library