6 Matching Results

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Background-reducing x-ray multilayer mirror (open access)

Background-reducing x-ray multilayer mirror

This invention is comprised of a background-reducing x-ray multilayer mirror. A multiple-layer ``wavetrap`` deposited over the surface of a layered synthetic microstructure soft x-ray mirror optimized for reflectivity at chosen wavelengths is disclosed for reducing the reflectivity of undesired, longer wavelength incident radiation incident thereon. In three separate mirror designs employing an alternating molybdenum and silicon layered mirrored structure overlaid by two layers of a molybdenum/silicon pair anti-reflection coating, reflectivities of near normal incidence 133, 171, and 186 {Angstrom} wavelengths have been optimized, while that at 304 {Angstrom} has been minimized. The optimization process involves the choice of materials, the composition of the layer/pairs as well as the number thereof, and the distance therebetween for the mirror, and the simultaneous choice of materials, the composition of the layer/pairs, their number and distance for the ``wavetrap.``
Date: August 3, 1990
Creator: Bloch, J. J.; Roussel-Dupre, D. & Smith, B. W.
System: The UNT Digital Library
Ductile nickel-silicon alloy (open access)

Ductile nickel-silicon alloy

An improvement over prior compositions wherein the ductility of Ni-Si alloys are improved with minor alloying additions of hafnium or zirconium.
Date: August 6, 1990
Creator: Oliver, W. C.
System: The UNT Digital Library
Ductile nickel-silicon alloy (open access)

Ductile nickel-silicon alloy

An improvement over prior compositions wherein the ductility of Ni-Si alloys are improved with minor alloying additions of hafnium or zirconium.
Date: August 6, 1990
Creator: Oliver, W. C.
System: The UNT Digital Library
Method for preparing homogeneous single crystal ternary III-V alloys (open access)

Method for preparing homogeneous single crystal ternary III-V alloys

A method for producing homogenous single crystal III--V ternary alloys of high crystal perfection using a floating crucible system in which the outer crucible holds a ternary alloy of the composition desired to be produced in the crystal and an inner floating crucible having a narrow, melt-passing channel in its bottom wall holds a small quantity of melt of a pseudo-binary liquidus composition which would freeze into the desired crystal composition. The alloy of the floating crucible is maintained at a predetermined lower temperature than the alloy of the outer crucible, and a single crystal of the desired homogeneous alloy is pulled out of the floating crucible melt, as melt from the outer crucible flows into a bottom channel of the floating crucible at a rate that corresponds to the rate of growth of the crystal.
Date: August 14, 1990
Creator: Ciszek, T. F.
System: The UNT Digital Library
A method of genetically engineering acidophilic, heterotrophic, bacteria by electroporation and conjugation (open access)

A method of genetically engineering acidophilic, heterotrophic, bacteria by electroporation and conjugation

A method of genetically manipulating an acidophilic bacteria is provided by two different procedures. Using electroporation, chimeric and broad-host range plasmids are introduced into Acidiphilium. Conjugation is also employed to introduce broad-host range plasmids into Acidiphilium at neutral pH.
Date: August 7, 1990
Creator: Roberto, F. F.; Glenn, A. W. & Ward, T. E.
System: The UNT Digital Library
Reflection mass spectrometry technique for monitoring and controlling composition during molecular beam epitaxy (open access)

Reflection mass spectrometry technique for monitoring and controlling composition during molecular beam epitaxy

This invention is comprised of a method for on-line accurate monitoring and precise control of molecular beam epitaxial growth of Groups III-III-V or Groups III-V-V layers in an advanced semiconductor device incorporates reflection mass spectrometry. The reflection mass spectrometry is responsive to intentional perturbations in molecular fluxes incident on a substrate by accurately measuring the molecular fluxes reflected from the substrate. The reflected flux is extremely sensitive to the state of the growing surface and the measurements obtained enable control of newly forming surfaces that are dynamically changing as a result of growth.
Date: August 15, 1990
Creator: Brennan, T. M.; Hammons, B. E. & Tsao, J. Y.
System: The UNT Digital Library