Patent relating to systems and methods for monitoring and testing patterning processes including etching, cleaning, and depositing of low k and ultra-low k dielectrics for semiconductor technologies.

Patent for a new and improved hay-press. This design consists, "in combination with the plungers and their rack-stems, the cog, the brackets . . . curved as described, and having the flange, combined with the ways . . . and the anti-friction rolls, operating each on the rear of one of the rack-stems . . . [which are] combined with the brackets, detachably secured to the press, their forward ends constituting in connection with the rear plate of the press guide-ways for said stems" (lines 80-100).