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Mechanism for etching of exfoliated graphene on substrates by low-energy electron irradiation from helium plasma electron sources
Article investigating the mechanism for etching of exfoliated graphene multilayers on SiO₂ by low-energy (50 eV) electron irradiation using He plasma systems for electron sources.
Date:
February 26, 2019
Creator:
Femi-Oyetoro, John D.; Yao, Kevin; Tang, Runtian; Ecton, Philip A.; Roccapriore, Kevin M.; Mhlanga, Ashley et al.
System:
The UNT Digital Library