Resource Type

Taming transport in InN (open access)

Taming transport in InN

The large electron affinity of InN, close to 6 eV and the largest of any III-V semiconductor, creates a strong driving force for native donor formation, both in the bulk and at surfaces and interfaces. Moreover, all InN surfaces, regardless of crystal orientation or doping, have been observed to have a surface accumulation layer of electrons, which interferes with standard electrical measurements. For these reasons, until recently, it was uncertain whether or not compensation by donor defects would prevent “real” p-type activity (i.e. existence of sufficiently shallow acceptors and mobile holes). A coordinated experimental approach using a combination of electrical (Hall effect) and electrothermal (Seebeck coefficient) measurements will be described that allows definitive evaluation of carrier transport in InN. In Mg-doped InN films, the sensitivity of thermopower to bulk hole conduction, combined with modeling of the parallel conducting layers (surface/bulk/interface), enables quantitative measurement of the free hole concentration and mobility. In undoped (n-type) material, combined Hall and thermopower measurements, along with a considering of the scattering mechanisms, leads to a quantitative understanding of the crucial role of charged line defects in limiting electron transport.
Date: May 29, 2011
Creator: Ager, Joel W., III & Miller, Nate R.
System: The UNT Digital Library
Modeling pulsed-laser melting of embedded semiconductor nanoparticles (open access)

Modeling pulsed-laser melting of embedded semiconductor nanoparticles

Pulsed-laser melting (PLM) is commonly used to achieve a fast quench rate in both thin films and nanoparticles. A model for the size evolution during PLM of nanoparticles confined in a transparent matrix, such as those created by ion-beam synthesis, is presented. A self-consistent mean-field rate equations approach that has been used successfully to model ion beam synthesis of germanium nanoparticles in silica is extended to include the PLM process. The PLM model includes classical optical absorption, multiscale heat transport by both analytical and finite difference methods, and melting kinetics for confined nanoparticles. The treatment of nucleation and coarsening behavior developed for the ion beam synthesis model is modified to allow for a non-uniform temperature gradient and for interacting liquid and solid particles with different properties. The model allows prediction of the particle size distribution after PLM under various laser fluences, starting from any particle size distribution including as-implanted or annealed simulated samples. A route for narrowing the size distribution of embedded nanoparticles is suggested, with simulated distribution widths as low as 15% of the average size.
Date: May 18, 2011
Creator: Sawyer, C. A.; Guzman, J.; Boswell-Koller, C. N.; Sherburne, M. P.; Mastandrea, J. P.; Bustillo, K. C. et al.
System: The UNT Digital Library
Photon Enhanced Thermionic Emission for Solar Energy Harvesting Final Report to the Global Climate and Energy Project (open access)

Photon Enhanced Thermionic Emission for Solar Energy Harvesting Final Report to the Global Climate and Energy Project

None
Date: May 7, 2013
Creator: Melosh, Nicholas; Shen, Zhi-Xun; Schwede, Jared; Riley, Dan; Rosenthal, Samuel; Narasimhan, Vijay et al.
System: The UNT Digital Library
Characterization of an Isoflavonoid-Specific Prenyltransferase from Lupinus albus (open access)

Characterization of an Isoflavonoid-Specific Prenyltransferase from Lupinus albus

Article on the characterization of an isoflavonoid-specific prenyltransferase from Lupinus albus.
Date: May 2012
Creator: Shen, Guoan; Huhman, David; Lei, Zhentian; Snyder, John; Sumner, Lloyd W. & Dixon, R. A.
System: The UNT Digital Library
Ammonia Oxidation at High Pressure and Intermediate Temperatures (open access)

Ammonia Oxidation at High Pressure and Intermediate Temperatures

This article describes ammonia oxidation experiments conducted at high pressure (30 bar and 100 bar) under oxidizing and stoichiometric conditions, respectively, and temperatures ranging from 450 to 925 K.
Date: May 10, 2016
Creator: Song, Yu; Hashemi, Hamid; Christensen, Jakob Munkholt; Zou, Chun; Marshall, Paul & Glarborg, Peter
System: The UNT Digital Library