As enterprises become increasingly information based, making improvements in their information activities is a top priority to assure their continuing competitiveness. A key to achieving these improvements is developing an Enterprise Information Architecture (EIA). An EIA can be viewed as a structured set of multidimensional interrelated elements that support all information processes. The current ad hoc EIAs in place within many enterprises can not meet their future needs because of a lack of a coherent framework, incompatibilities, missing elements, few and poorly understood standards, uneven quality and unnecessary duplications. This paper discusses the EIA developed at Lawrence Livermore National Laboratory as a case study, for other information based enterprises, particularly those with decentralized and autonomous organization structures and cultures. While the architecture is important, the process by which it is developed and sustained over time is equally important. This paper outlines the motivation for an EIA and discusses each of the interacting elements identified. It also presents an organizational structure and processes for building a sustainable EIA activity.

Quasi-axisymmetry, external kinks and ballooning stability are studied with respect to the plasma shaping and variation in the pressure and current profiles for NCSX. We show that while the kink stability may require a delicate boundary shaping, most quasi-axisymmetry may be achieved using a few low order modes that eliminate the large mirror fields arising partly from boundary shaping for the kink stability. In addition, we demonstrate that the kink and ballooning instability may be improved in the NCSX configurations by a more peaked pressure profile or a broader current profile. Finally, we show numerically that it is possible to construct a quasi-axisymmetric configuration that is stable to the external kink at all current levels for which the edge rotational transform is less than 0.5.

The mask is deemed one of the areas that require significant research and development in EUVL. Silicon wafers will be used for mask substrates for an alpha-class EUVL exposure tool due to their low-defect levels and high quality surface finish. However, silicon has a large coefficient of thermal expansion that leads to unacceptable image distortion due to absorption of EUV light. A low thermal expansion glass or glass-ceramic is likely to be required in order to meet error budgets for the 70nm node and beyond. Since EUVL masks are used in reflection, they are coated with multilayers prior to patterning. Surface imperfections, such as polishing marks, particles, scratches, or digs, are potential nucleation sites for defects in the multilayer coating, which could result in the printed defects. Therefore we are accelerating developments in the defect reduction and surface finishing of low thermal expansion mask substrates in order to understand long-term issues in controlling printable defects, and to establish the infrastructure for supplying masks. In this paper, we explain the technical requirements for EUVL mask substrates and describe our efforts in establishing a SEMI standard for EUVL masks. We will also report on the early progress of our suppliers in producing …

Radiative mantle experiments were performed on JET ELMy H-mode plasmas. The Septum configuration was used where the X-point is embedded into the top of the Septum. Argon radiated 50% of the input power from the bulk plasma while Z{sub eff} rose from an intrinsic level of 1.5 to about 1.7 due to the injected Argon. The total energy content and global energy confinement time decreased 15% when the impurities were introduced. In contrast, the effective thermal diffusivity in the core confinement region (r/a = .4--.8) decreased by 30%. Usually, JET ELMy H-mode plasmas have confinement that is correlated to the edge pedestal pressure. The radiation lowered the edge pedestal and consequently lowered the global confinement. Thus the confinement was changed by a competition between the edge pedestal reduction lowering the confinement and the weaker RI effect upon the core transport coefficients raising the confinement. The ELM frequency increased from 10 Hz Type I ELMs, to 200 Hz type III ELMs. The energy lost by each ELM reduced to 0.5% of the plasma energy content.