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Metrology of 13-nm optics for extreme ultraviolet lithography
This report documents activities carried in support of the design and construction of an ultra-high precision measuring machine intended for the support of Extreme Ultraviolet Lithography development (for semiconductor fabrication). At the outset, this project was aimed at the overall fabrication of such a measuring machine. Shortly after initiation, however, the scope of activities was reduced and effort was concentrated on the key technical advances necessary to support such machine development: high accuracy surface sensing and highly linear distance interferometry.
Date:
February 3, 1997
Creator:
Beckwith, J.F.; Patterson, S.R.; Thompson, D.C.; Badami, V. & Smith, S.
System:
The UNT Digital Library