Taking two resistance readings, at room temperature and at -196°C when the substrate is submerged in liquid nitrogen provides a convenient means of measuring the TCR of tantalum-nitride films. The liquid nitrogen provides a large, controlled temperature differential that can be used conveniently in the production environment. A digital-readout tester with only a simple nulling adjustment makes it possible to read the TCR of the film directly on the DVM indicator. This method provides the prompt TCR information feedback necessary to control the tantalum-nitride sputtering process and results in substantial time and materials savings.